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AMAT Applied Materials 0225-33921控制器装置

发布时间:2025-09-25人气:
  • AMAT Applied Materials 0225-33921控制器装置
  • AMAT Applied Materials 0225-33921控制器装置
  • AMAT Applied Materials 0225-33921控制器装置

AMAT Applied Materials 0225-33921控制器装置 

1.产 品 资 料 介 绍:

AMAT Applied Materials 0225‑33921 控制器装置为晶圆制造设备的中央逻辑控制单元,采用模块化设计,集成多通道 I/O、实时控制与高速通信功能,可精确协调多腔室系统的工艺、传输与检测流程。

核心规格

项目规格备注
适用平台Centura、Endura、Sym3 等多腔室设备支持 200 mm/300 mm 晶圆
控制架构实时操作系统(VxWorks)确保时序精确与稳定
通信接口SECS/GEM、EtherNet、RS‑485支持工厂自动化集成
I/O 配置数字量输入 / 输出、模拟量输入 / 输出可扩展至数百通道
电源输入双冗余 24 VDC支持热插拔
工作温度0–40℃需风冷或温控环境
尺寸标准 1U/2U 机架式便于安装维护
认证SEMI S2、CE、UL符合半导体行业安全标准

功能特点

  • 多任务并行处理:可同时管理刻蚀、PVD/CVD、离子注入等工艺步骤。
  • 故障诊断与安全联锁:实时监测设备状态,异常时自动停机。
  • 高可靠性设计:冗余电源与关键部件备份,降低停机风险。
  • 模块化扩展:可灵活增减 I/O 模块,适应不同工艺需求。
  • 快速系统集成:支持 SECS/GEM 协议,可快速接入现有自动化生产线。

典型应用

  • 刻蚀(Etch)与化学气相沉积(CVD)系统
  • 物理气相沉积(PVD)与原子层沉积(ALD)系统
  • 离子注入机与晶圆传输系统

AMAT Applied Materials 0225-33921控制器装置 英文资料:

The AMAT Applied Materials 0225-33921 controller device is the central logic control unit of wafer manufacturing equipment. It adopts a modular design, integrates multi-channel I/O, real-time control, and high-speed communication functions, and can accurately coordinate the process, transmission, and detection flow of multi chamber systems.

Core specifications

Project specification remarks

Suitable for multi chamber devices such as Centura, Endura, Sym3, etc., supporting 200mm/300mm wafers

Control architecture real-time operating system (VxWorks) ensures timing accuracy and stability

Communication interfaces SECS/GEM, EtherNet, RS-485 support factory automation integration

I/O configuration with digital input/output and analog input/output expandable to hundreds of channels

Dual redundant 24 VDC power input supports hot swapping

Working temperature 0-40 ℃ requires air cooling or temperature controlled environment

Size standard 1U/2U rack mounted for easy installation and maintenance

Certification: SEMI S2, CE, UL comply with semiconductor industry safety standards

Features

Multi task parallel processing: capable of simultaneously managing etching PVD/CVD、 Process steps such as ion implantation.

Fault diagnosis and safety interlock: Real time monitoring of equipment status, automatic shutdown in case of abnormalities.

High reliability design: redundant power supply and critical component backup to reduce downtime risk.

Modular expansion: It can flexibly add or remove I/O modules to adapt to different process requirements.

Fast system integration: Supports SECS/GEM protocol and can quickly integrate into existing automated production lines.

Typical Applications

Etch and CVD systems

Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) Systems

Ion implantation machine and wafer transfer system

AMAT Applied Materials  0225-33921控制器装置 产品展示      

325-0201_amat_applied_0225-33921_unit_mfc1160a_chf3_100sccm_asis_2.jpg

 产品视频

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218

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