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AMAT Applied Materials 0090-06421控制器

发布时间:2025-09-25人气:
  • AMAT Applied Materials 0090-06421控制器
  • AMAT Applied Materials 0090-06421控制器
  • AMAT Applied Materials 0090-06421控制器

AMAT Applied Materials 0090-06421控制器

1.产 品 资 料 介 绍:

AMAT Applied Materials 0090‑06421 是一款模块化工业控制器,主要用于半导体制造设备的运动、温度、气体流量等参数的实时控制与协调,适配 Centura、Endura、P5000 等多腔室平台。

核心规格

项目规格备注
适用平台Centura、Endura、P5000、Producer 等多腔室工艺系统
控制类型运动控制、温度控制、气体流量控制支持混合控制
通信接口SECS/GEM、EtherNet、RS‑485、Profibus支持工厂自动化
处理器 / 系统32 位 RISC 处理器;VxWorks 实时操作系统确保高精度时序
电源输入24 VDC(冗余输入)提高可靠性
工作温度0℃~40℃(部分需降额)自然风冷
尺寸标准 1U/2U 机架式或 PCB 插件便于安装
认证CE、UL、SEMI S2符合半导体行业标准
扩展能力支持 I/O、通信、专用功能模块扩展灵活配置

功能特点

  • 多参数协同控制:可同时管理晶圆传输、工艺腔室温度、气体流量等,确保多工序同步执行。
  • 高可靠性设计:冗余电源与关键部件备份,适应长时间连续运行。
  • 模块化架构:支持按需增减模块,满足不同工艺需求。
  • 快速系统集成:通过 SECS/GEM 协议可快速接入工厂自动化系统,实现远程监控与数据采集。

典型应用

  • 刻蚀(Etch)与化学气相沉积(CVD)系统
  • 物理气相沉积(PVD)与原子层沉积(ALD)系统
  • 离子注入机与晶圆传输系统
  • 平板显示(LCD/OLED)制造设备

AMAT Applied Materials  0090-06421控制器 英文资料:

AMAT Applied Materials 0090-06421 is a modular industrial controller primarily used for real-time control and coordination of parameters such as motion, temperature, and gas flow in semiconductor manufacturing equipment. It is compatible with multi chamber platforms such as Centura, Endura, and P5000.

Core specifications

Project specification remarks

Suitable for multi chamber process systems such as Centura, Endura, P5000, Producer, etc

Control types include motion control, temperature control, gas flow control, and support for mixed control

Communication interfaces SECS/GEM, EtherNet, RS-485, Profibus support factory automation

32-bit RISC processor/system; VxWorks real-time operating system ensures high-precision timing

Power input 24   VDC (redundant input) improves reliability

Working temperature: 0 ℃~40 ℃ (some require derating) Natural air cooling

Size standard 1U/2U rack mounted or PCB plug-in for easy installation

Certified CE, UL, SEMI S2 in compliance with semiconductor industry standards

Expansion capability supports flexible configuration of I/O, communication, and specialized functional module expansion

Features

Multi parameter collaborative control: It can simultaneously manage wafer transfer, process chamber temperature, gas flow rate, etc., ensuring synchronous execution of multiple processes.

High reliability design: redundant power supply and critical component backup, suitable for long-term continuous operation.

Modular architecture: supports adding or removing modules as needed to meet different process requirements.

Fast system integration: Through the SECS/GEM protocol, factory automation systems can be quickly integrated to achieve remote monitoring and data collection.

Typical Applications

Etch and CVD systems

Physical Vapor Deposition (PVD) and Atomic Layer Deposition (ALD) Systems

Ion implantation machine and wafer transfer system

Flat panel display (LCD/OLED) manufacturing equipment

AMAT Applied Materials   0090-06421控制器  产品展示      

applied_materials_amat_0090-06421_0090-07029_controller_3.jpg

 产品视频

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218

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