AMAT Applied Materials 0100-90881气体面板分析

1.产 品 资 料 介 绍：

AMAT Applied Materials 0100-90881气体面板分析 英文资料：

1、 High precision gas control: ensuring stable gas supply for semiconductor processes

As the "gas dispatch center" of semiconductor equipment, the 0100-90881 gas panel focuses on precise gas flow and pressure control, providing gases that meet purity and parameter requirements for key processes such as etching and deposition, directly affecting the quality of wafer processing

Multi channel gas independent control

Integrate 8-12 independent gas channels (depending on the configuration), which can simultaneously adapt to commonly used gases in semiconductor processes (such as CF ₄ and O ₂ for etching, SiH ₄ and NH3 for deposition). Each channel is equipped with an independent flow control unit and pressure monitoring module, supporting differentiated parameter settings for different gases (such as flow range 0-500 sccm/0-2000 sccm, pressure control range 0.1-10 bar). The isolation between channels is ≥ 10 ⁻, avoiding gas cross contamination and meeting the gas switching requirements of multiple process steps.

High precision flow and pressure control

Adopting a mass flow controller (MFC, presumably developed by AMAT or compatible with Brooks brand), the flow control accuracy reaches ± 1% F.S., the repeatability is ≤± 0.5% F.S., and can achieve 0.1 sccm level fine-tuning to ensure stable process gas flow and avoid etching depth deviation (≤± 2%) or uneven film thickness caused by flow fluctuations; Equipped with high-precision pressure sensors (measurement accuracy ± 0.25% F.S.), real-time monitoring of gas pipeline pressure, pressure compensation completed within 50ms through PID closed-loop control algorithm, pressure fluctuation range ≤ ± 0.01 bar, ensuring stable gas supply pressure.

Gas purity assurance design

The internal pipelines and joints are made of 316L stainless steel material (inner wall roughness Ra ≤ 0.8 μ m), and undergo electrochemical polishing and passivation treatment to reduce gas adsorption and residue; Equipped with an ultra-high pressure gas filter (with a filtration accuracy of 0.01 μ m), it can filter out small particles and impurities in the gas, avoiding particle contamination of the wafer surface (with a filtration efficiency of ≥ 99.99% for particle sizes ≥ 0.1 μ m); Simultaneously supporting gas preheating function (preheating temperature adjustable between 30-60 ℃), preventing high viscosity gases (such as certain metal organic compounds) from condensing in the pipeline and ensuring gas composition uniformity.

AMAT Applied Materials 0100-90881气体面板分析 产品展示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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