Huttinger  PFM1500A射频发电机

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Overview of Huttinger PFM1500A RF Generator

The Huttinger PFM1500A, as a high-performance RF generator, plays a crucial role in various fields such as semiconductors, photovoltaics, display panels, and vacuum process equipment due to its stable and reliable performance. It can output stable RF power in the standard RF frequency band of 13.56 MHz and work in conjunction with matching networks to achieve efficient energy transmission, providing solid energy support for various precision processes.

The model of the RF generator is PFM1500A, with an output power of up to 1500 W, a fixed operating frequency in the industrial standard frequency band of 13.56 MHz, a power input of 230 V, and an output interface using a standard 50 Ω coaxial interface. These parameters enable it to adapt well to various industrial scenarios and equipment requirements.

In terms of technical features, high power output is its significant advantage. The continuous RF power output of 1500 W level can meet the requirements of high-energy density processes, providing sufficient power for processes that require strong energy support such as plasma etching and thin film deposition; Stable frequency is another highlight, fixed at 13.56 MHz, which conforms to international standard RF frequency bands. This not only ensures the universality of the equipment in various plasma processes, but also guarantees the stability and consistency of the process; The automatic impedance matching function works in conjunction with the matching network to achieve impedance matching between the plasma load and the power supply, effectively reducing reflected power, improving energy transmission efficiency, and reducing energy loss; Efficient heat dissipation design provides a guarantee for the long-term stable operation of equipment. Even in the case of continuous high-power output, the internal optimized heat dissipation system can dissipate heat in a timely manner, avoiding the impact of overheating on equipment performance; In addition, the remote/local control function supports local panel control or external interface remote control, greatly facilitating the integration of equipment into automated process equipment and improving operational flexibility and convenience.

In terms of application fields, the Huttinger PFM1500A RF generator is widely used. In semiconductor manufacturing, it can be used for key processes such as plasma etching, ion implantation, CVD/PVD film deposition, etc., providing stable RF energy for precision manufacturing of semiconductor devices; In the photovoltaic industry, providing radio frequency plasma excitation in the thin film coating process of solar cells can help improve the performance and quality of solar cells; In the field of display panel manufacturing, it is suitable for thin film deposition and processing of large-area glass substrates in TFT-LCD and OLED processes, ensuring the production efficiency and quality of display panels; In terms of vacuum coating and material surface treatment, it can be used for the preparation of optical films, hard coatings, and functional films to enhance the performance and functionality of material surfaces; At the same time, in the scientific research experimental platform, it serves as a stable RF energy source, providing reliable support for materials science and plasma physics experiments, and facilitating the smooth progress of scientific research work.

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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