AMAT  0010-70162控制器

1.产 品 资 料 介 绍：

AMAT 0010-70162 控制器

产品概述

AMAT（Applied Materials）0010-70162 控制器是一款用于半导体制造设备的专用控制模块，主要承担设备运行参数的监控、执行逻辑的处理以及外围部件的协调控制任务。该控制器在 AMAT 的沉积、刻蚀、离子注入等工艺设备中扮演“大脑”的角色，通过高速信号处理与逻辑判断，实现对工艺过程的精准控制与安全管理。

技术参数（典型方向，具体参数需参考原厂文档）

• 控制逻辑：支持多任务并行处理，具备实时工艺控制能力

• 接口类型：支持多种模拟/数字 I/O 接口、总线接口，便于与传感器、执行器、上位机通讯

• 处理性能：工业级嵌入式处理器，适合长时间高负荷运作

• 安全机制：内置故障检测和互锁保护逻辑

• 适配性：专为 AMAT 半导体工艺设备平台定制

应用场景

1. 沉积设备控制

   • 在 CVD、PVD、ALD 等工艺设备中，用于管理腔体温度、气体流量、等离子体功率等关键参数。

   • 确保薄膜沉积的均匀性与重复性。

2. 刻蚀系统

   • 监测和调节反应腔体的气体比例、真空度、RF 功率，保障刻蚀速率与轮廓精度。

   • 实现刻蚀工艺中对参数的实时反馈与快速修正。

3. 离子注入设备

   • 控制束流能量、角度及扫描过程，确保离子注入的均匀性与器件特性稳定。

4. 工艺气体与真空系统

   • 作为气体面板、真空泵、阀门等执行单元的集中控制核心，协调运行逻辑。

5. 工厂自动化与联锁保护

   • 在晶圆厂自动化环境中，控制器可与中央监控系统通信，执行互锁与联动保护。

   • 避免工艺异常、硬件故障导致的生产中断。

6. 研发与实验室应用

   • 用于新工艺开发和实验平台，支持多变量实验参数的调节与记录。

AMAT  0010-70162控制器 英文资料：

AMAT 0010-70162 Controller

Product Overview

The AMAT (Applied Materials) 0010-70162 controller is a specialized control module used in semiconductor manufacturing equipment, mainly responsible for monitoring equipment operating parameters, processing execution logic, and coordinating control tasks of peripheral components. This controller plays the role of the "brain" in AMAT's deposition, etching, ion implantation and other process equipment, achieving precise control and safety management of the process through high-speed signal processing and logical judgment.

Technical parameters (typical direction, specific parameters need to refer to the original factory documentation)

Control logic: Supports multitasking parallel processing and has real-time process control capability

Interface type: Supports multiple analog/digital I/O interfaces and bus interfaces, facilitating communication with sensors, actuators, and upper computers

Processing performance: Industrial grade embedded processor, suitable for long-term high load operation

Security mechanism: Built in fault detection and interlock protection logic

Adaptability: Customized for AMAT semiconductor process equipment platform

Application scenarios

Sedimentation equipment control

Used in CVD, PVD, ALD and other process equipment to manage key parameters such as chamber temperature, gas flow rate, plasma power, etc.

Ensure the uniformity and repeatability of thin film deposition.

Etching system

Monitor and adjust the gas ratio, vacuum degree, and RF power of the reaction chamber to ensure etching rate and contour accuracy.

Realize real-time feedback and rapid correction of parameters in etching process.

Ion implantation equipment

Control the beam energy, angle, and scanning process to ensure the uniformity of ion implantation and stable device characteristics.

Process gas and vacuum system

As the centralized control core of execution units such as gas panels, vacuum pumps, valves, etc., it coordinates the operation logic.

Factory automation and interlocking protection

In the wafer fab automation environment, the controller can communicate with the central monitoring system to perform interlocking and linkage protection.

To avoid production interruptions caused by process abnormalities or hardware failures.

Research and laboratory applications

Used for new process development and experimental platform, supporting the adjustment and recording of multivariate experimental parameters.

AMAT  0010-70162控制器 产品展示      

 产品视频

3.其他产品

IS200TRLYH1BGF 频率转换器
IS220PAICH1B 分析输入/输出模块
IS220PDOAH1A 处理器模块

4.其他英文产品

IW93-2 HESG440356R1 HESG216678B module
NF93A-2 HESG440280R2 module
SST-PFB-SLC Communication module

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218