AMAT  0015-09091相位角转换器

1.产 品 资 料 介 绍：

AMAT 0015-09091 相位角转换器

产品概述

AMAT（Applied Materials）0015-09091 相位角转换器是一种电子信号处理模块，主要用于半导体设备中对交流信号或工艺相关信号的相位调整和同步处理。它可以将输入信号的相位转换为设备所需的参考相位，从而保证多路设备或工艺子系统间的同步运行。该模块在等离子体发生器、射频功率控制或其他需要精确相位控制的工艺系统中应用广泛。

技术参数（典型方向，具体数据需参考原厂资料）

• 输入信号类型：交流信号或特定工艺参考信号

• 相位控制范围：0°–360°可调，支持连续或离散调节

• 输出信号：与输入信号相位调整后的同步信号

• 精度：高精度相位转换，误差低于数度

• 工作环境：适应半导体设备高洁净、低噪声电磁环境

• 接口：兼容 AMAT 工艺设备控制系统

应用场景

1. 等离子体发生器控制

   • 调整射频信号相位，确保等离子体功率分布均匀，优化刻蚀或沉积工艺。

2. 射频功率同步

   • 多路射频模块或功率源之间的相位匹配，保证功率输出协调一致。

3. 沉积工艺（CVD/PVD）

   • 在多源沉积或交替工艺中，通过相位控制优化薄膜均匀性。

4. 刻蚀工艺

   • 通过相位调整控制等离子体轮廓和刻蚀速率，实现精细图案加工。

5. 工艺设备信号同步

   • 设备间或子模块间的信号协调，确保多系统同时启动或停止，避免工艺干扰。

6. 实验与研发平台

   • 支持新工艺开发中对相位敏感参数的调节与验证。

AMAT  0015-09091相位角转换器 英文资料：

AMAT 0015-09091 Phase Angle Converter

Product Overview

AMAT (Applied Materials) 0015-09091 phase angle converter is an electronic signal processing module mainly used for phase adjustment and synchronization processing of AC signals or process related signals in semiconductor equipment. It can convert the phase of the input signal into the reference phase required by the device, thereby ensuring synchronous operation between multiple devices or process subsystems. This module is widely used in plasma generators, RF power control, or other process systems that require precise phase control.

Technical parameters (typical direction, specific data should refer to the original factory information)

Input signal type: AC signal or specific process reference signal

Phase control range: adjustable from 0 ° to 360 °, supporting continuous or discrete adjustment

Output signal: synchronized signal after phase adjustment with the input signal

Accuracy: High precision phase conversion, with errors below a few degrees

Work environment: Suitable for semiconductor equipment with high cleanliness and low noise electromagnetic environment

Interface: Compatible with AMAT process equipment control system

Application scenarios

Plasma generator control

Adjust the phase of the RF signal to ensure uniform plasma power distribution and optimize the etching or deposition process.

RF power synchronization

Phase matching between multiple RF modules or power sources ensures coordinated and consistent power output.

Deposition process (CVD/PVD)

Optimizing film uniformity through phase control in multi-source sedimentation or alternating processes.

etching process

By adjusting the phase to control the plasma profile and etching rate, fine pattern processing can be achieved.

Synchronization of process equipment signals

Signal coordination between equipment or submodules ensures that multiple systems start or stop simultaneously, avoiding process interference.

Experimental and R&D platform

Support the adjustment and validation of phase sensitive parameters in the development of new processes.

AMAT  0015-09091相位角转换器 产品展示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218