AMAT  0050-37127气门杆

1.产 品 资 料 介 绍：

AMAT 0050-37127 气门杆

产品概述

AMAT（Applied Materials）0050-37127 气门杆是半导体工艺设备中气体输送与真空控制系统的关键机械部件之一，通常作为阀门组件的核心执行元件，起到阀门开闭、密封和流量调节的作用。其质量与精度直接影响气体控制的稳定性和工艺的均匀性。

技术参数（典型方向，具体数据需参考原厂资料）

• 材质：高强度不锈钢或合金材料，具备耐腐蚀与高真空适应性

• 表面处理：精密加工与光洁度处理，减少摩擦和颗粒产生

• 适用环境：高真空、超净室工艺环境

• 精度：高同轴度与耐磨性，保证阀门启闭的重复性

• 兼容性：适配 AMAT 多种工艺气体控制阀门

应用场景

1. 半导体气体输送系统

   • 安装在气体阀门中，用于控制氮气、氩气、氟化物、硅烷等高纯工艺气体的输送。

   • 确保流量稳定、反应气氛一致。

2. 真空腔体控制

   • 用于真空阀门，实现腔体抽真空、充气过程的启闭切换。

   • 保障腔体环境的快速稳定。

3. 沉积工艺（CVD/PVD/ALD）

   • 通过阀门启闭控制气体反应源的供给，确保薄膜沉积均匀性和膜层质量。

4. 刻蚀工艺

   • 调控反应性气体流量，保证刻蚀速率和形貌控制。

5. 离子注入与清洗工艺

   • 控制腔体内辅助气体（如氮气、氧气）的稳定供给。

6. 设备维护与替换

   • 作为易损件之一，在设备长期运行中需定期更换，以维持气体控制的精确性。

AMAT 0050-37127气门杆  英文资料：

AMAT 0050-37127 Valve Stem

Product Overview

AMAT (Applied Materials) 0050-37127 valve stem is one of the key mechanical components of gas delivery and vacuum control systems in semiconductor process equipment. It is usually used as the core actuator of valve components, playing a role in valve opening and closing, sealing, and flow regulation. Its quality and accuracy directly affect the stability of gas control and the uniformity of the process.

Technical parameters (typical direction, specific data should refer to the original factory information)

Material: High strength stainless steel or alloy material, with corrosion resistance and high vacuum adaptability

Surface treatment: precision machining and smoothness treatment to reduce friction and particle generation

Applicable environment: high vacuum, ultra clean room process environment

Accuracy: High coaxiality and wear resistance, ensuring the repeatability of valve opening and closing

Compatibility: Compatible with various AMAT process gas control valves

Application scenarios

Semiconductor gas delivery system

Installed in gas valves, it is used to control the transportation of high-purity process gases such as nitrogen, argon, fluoride, silane, etc.

Ensure stable flow and consistent reaction atmosphere.

Vacuum chamber control

Used for vacuum valves to switch the opening and closing of the chamber during vacuum pumping and inflation processes.

Ensure the rapid stability of the cavity environment.

Deposition process (CVD/PVD/ALD)

Control the supply of gas reaction source through valve opening and closing to ensure the uniformity of film deposition and film quality.

etching process

Regulate the flow rate of reactive gases to ensure etching rate and morphology control.

Ion implantation and cleaning process

Control the stable supply of auxiliary gases (such as nitrogen and oxygen) inside the control chamber.

Equipment maintenance and replacement

As one of the vulnerable parts, the equipment needs to be replaced regularly during long-term operation to maintain the accuracy of gas control.

AMAT 0050-37127气门杆 产品展示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218