AMAT 0010-77681控制箱系统

1.产 品 资 料 介 绍：

AMAT 0010-77681 控制箱系统

产品概述

AMAT（Applied Materials）0010-77681 控制箱系统是半导体制造设备的集中控制单元，通常包含电源模块、控制器、接口电路和必要的安全保护组件。它作为设备电子与电气系统的核心枢纽，负责向各子模块（如气体阀门、加热器、探测器板、驱动模块等）分配电源、传输控制信号，并实现设备的集中监控和管理。

技术参数（典型方向，具体数据需参考原厂资料）

• 系统类型：集成电源、控制与信号分配的机箱系统

• 输入电源：工业标准 AC 电源，支持多路电压输出

• 接口类型：多路数字/模拟 I/O，支持与设备内部控制器、传感器、执行器连接

• 安全功能：过载保护、过压保护、短路防护和互锁逻辑

• 适配平台：适用于 AMAT 多种沉积、刻蚀、离子注入及相关半导体工艺设备

应用场景

1. 沉积工艺（CVD/PVD/ALD）

   • 为腔体加热器、气体阀门、泵浦及探测器模块提供稳定电源和控制信号。

   • 协调各子系统运行，保证薄膜沉积均匀性和工艺稳定性。

2. 刻蚀工艺设备

   • 控制射频功率模块、气体流量和压力传感器的工作，实现精确刻蚀过程控制。

3. 离子注入系统

   • 负责离子源、扫描系统及束流监测模块的电源和信号管理，保证剂量与均匀性。

4. 气体与真空系统控制

   • 集中管理阀门、流量计、真空泵和压力传感器，维持腔体环境稳定。

5. 工厂自动化与安全联锁

   • 实现设备与上位监控系统的接口，执行互锁、报警和安全保护逻辑。

6. 研发与实验室工艺验证

   • 提供模块化、可扩展的电气控制平台，支持新工艺开发和实验验证。

AMAT 0010-77681控制箱系统 英文资料：

AMAT 0010-77681 Control Box System

Product Overview

The AMAT (Applied Materials) 0010-77681 control box system is a centralized control unit for semiconductor manufacturing equipment, typically consisting of power modules, controllers, interface circuits, and necessary safety protection components. As the core hub of electronic and electrical systems, it is responsible for distributing power to various sub modules (such as gas valves, heaters, detector boards, drive modules, etc.), transmitting control signals, and achieving centralized monitoring and management of equipment.

Technical parameters (typical direction, specific data should refer to the original factory information)

System type: Integrated power, control, and signal distribution chassis system

Input power supply: Industrial standard AC power supply, supporting multiple voltage outputs

Interface type: Multi channel digital/analog I/O, supporting connection with internal controllers, sensors, and actuators of the device

Safety functions: overload protection, overvoltage protection, short circuit protection, and interlock logic

Adaptation Platform: Suitable for various deposition, etching, ion implantation, and related semiconductor process equipment in AMAT

Application scenarios

Deposition process (CVD/PVD/ALD)

Provide stable power and control signals for chamber heaters, gas valves, pumps, and detector modules.

Coordinate the operation of various subsystems to ensure the uniformity of thin film deposition and process stability.

Etching process equipment

Control the operation of the RF power module, gas flow rate, and pressure sensor to achieve precise etching process control.

Ion implantation system

Responsible for power and signal management of ion sources, scanning systems, and beam monitoring modules to ensure dose and uniformity.

Gas and vacuum system control

Centralize the management of valves, flow meters, vacuum pumps, and pressure sensors to maintain a stable chamber environment.

Factory automation and safety interlocking

Implement the interface between the device and the upper monitoring system, and execute interlocking, alarm, and security protection logic.

R&D and laboratory process validation

Provide a modular and scalable electrical control platform that supports new process development and experimental validation.

AMAT 0010-77681控制箱系统 产品展示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

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