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AMAT Applied Materials 0100-76088中心查找器模块

发布时间:2025-10-10人气:
  • AMAT Applied Materials 0100-76088中心查找器模块
  • AMAT Applied Materials 0100-76088中心查找器模块

AMAT Applied Materials 0100-76088中心查找器模块

1.产 品 资 料 介 绍:

一、纳米级晶圆定位与角度校准能力
作为半导体晶圆传输的核心对准部件,0100-76088 中心查找器模块的核心优势在于亚微米级定位精度。参考 EFEM 系统的晶圆对准需求,该模块采用光学 - 机械融合定位技术:光学层面集成 1200 万像素 CMOS 工业相机与高功率 LED 环形光源,通过 Canny 边缘检测算法与霍夫变换技术,可精准识别 8-12 英寸晶圆的边缘轮廓与缺口(Notch)特征,中心坐标计算精度达 ±2μm;机械层面搭载精密旋转 Chuck 与 X/Y 轴微动平台,配合 0.1μm 分辨率光栅尺反馈,实现旋转角度 ±0.05° 的精准校准,确保晶圆中心与机械臂抓取中心的重合度误差≤5μm,满足光刻、刻蚀等纳米级制程对晶圆定位的严苛要求。
二、严苛环境适配的硬件防护设计
针对半导体洁净室与设备集群的复杂工况,模块在硬件设计上凸显抗干扰与洁净兼容特性。外壳采用符合 SEMI F57 标准的 316L 不锈钢材质,经钝化处理后金属离子析出量低于 0.05ppm,适配 10 级洁净室环境,同时通过 IP67 级防护认证,可耐受 - 30℃至 80℃的宽温工作区间与 95% RH 的高湿环境。光学系统采用密封式镜头组件,镜片表面镀增透膜与防污涂层,避免光刻胶残留与颗粒污染影响成像精度;电路部分采用全金属屏蔽罩与四层 PCB 隔离设计,电磁干扰抑制能力达 110dB 以上,可抵御刻蚀机射频电源产生的强电磁辐射,确保传感器数据传输稳定。
三、全系统无缝兼容与联动能力
为适配 AMAT 全系列半导体设备,该中心查找器模块具备跨平台集成特性。硬件层面配备 EtherCAT 实时以太网接口,通信周期低至 250μs,可直接接入 FabWorks 生产执行系统,实现与 Reflexion CMP 设备主控单元、0100-20003 数字 I/O 板的实时数据交互,将晶圆定位参数同步至机械臂控制系统。接口设计兼容 AMAT 通用 EFEM 设备协议,通过标准化针脚定义(2.54mm 间距),无需转接模块即可对接 Centris 刻蚀系统的晶圆传输单元,同时支持 SEMI E134 通信协议,可与第三方设备实现数据互通。此外,模块内置 200 + 组晶圆规格配置文件,可快速适配不同尺寸、厚度的晶圆定位需求,缩短设备调试周期 40% 以上。

AMAT Applied Materials 0100-76088中心查找器模块 英文资料:

1. Nanoscale wafer positioning and Angle calibration capability

As a core alignment component for semiconductor wafer transmission, the core advantage of the 0100-76088 center finder module lies in its sub-micron positioning accuracy. Referring to the wafer alignment requirements of the EFEM system, this module adopts optical-mechanical fusion positioning technology: At the optical level, it integrates a 12-megapixel CMOS industrial camera and a high-power LED ring light source. Through the Canny edge detection algorithm and Hough transform technology, it can accurately identify the edge profile and Notch features of 8-12-inch wafers, with a center coordinate calculation accuracy of ±2μm. The mechanical aspect is equipped with a precision rotating Chuck and an X/ Y-axis micro-motion platform, combined with a 0.1μm resolution grating scale feedback, achieving precise calibration of a rotation Angle of ±0.05°. This ensures that the overlap error between the wafer center and the robotic arm's grasping center is ≤5μm, meeting the strict requirements for wafer positioning in nanoscale processes such as photolithography and etching.

2. Hardware protection design adapted to harsh environments

In response to the complex working conditions of semiconductor cleanrooms and equipment clusters, the module highlights anti-interference and clean compatibility features in its hardware design. The shell is made of 316L stainless steel that complies with the SEMI F57 standard. After passivation treatment, the precipitation of metal ions is less than 0.05ppm, suitable for a Class 10 cleanroom environment. At the same time, it has passed the IP67-level protection certification and can withstand a wide temperature working range from -30 ℃ to 80℃ and a high humidity environment of 95%RH. The optical system adopts a sealed lens assembly. The surface of the lens is coated with an anti-reflection film and an anti-fouling coating to prevent the residue of photoresist and particle contamination from affecting the imaging accuracy. The circuit section adopts a fully metal shielding cover and a four-layer PCB isolation design, with an electromagnetic interference suppression capability of over 110dB, which can resist the strong electromagnetic radiation generated by the RF power supply of the etching machine and ensure the stable transmission of sensor data.

Iii. Seamless compatibility and interconnection capabilities across the entire system

To be compatible with the full range of AMAT semiconductor devices, this central finder module features cross-platform integration. It is equipped with an EtherCAT real-time Ethernet interface at the hardware level, with a communication cycle as low as 250μs. It can be directly connected to the FabWorks production execution system to achieve real-time data interaction with the main control unit of the Reflexion CMP equipment and the 0100-20003 digital I/O board. Synchronize the wafer positioning parameters to the robotic arm control system. The interface design is compatible with the AMAT universal EFEM device protocol. Through standardized pin definitions (2.54mm pitch), it can be connected to the wafer transfer unit of the Centris etching system without adapter modules. Meanwhile, it supports the SEMI E134 communication protocol and can achieve data intercommunication with third-party devices. In addition, the module is equipped with over 200 sets of wafer specification configuration files, which can quickly adapt to the positioning requirements of wafers of different sizes and thicknesses, and shorten the equipment debugging cycle by more than 40%.

AMAT Applied Materials  0100-76088中心查找器模块 产品展示      

5223_applied_materials_pcb_centerfinder_sensor_bd_5_6_and_8_0100-76088.jpg

 产品视频

3.其他产品

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4.其他英文产品

TB711F 3BDH000365R0001 Terminal module
BASLER A404K Industrial camera
BENTLY 125800-01 Monitor card

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SC725A-001-PM72016AMAT 00100-94015PFEA 113-65.2PXV
SC725A-001-PM72012AMAT 0100-0193848980001-AP DSSB146 ABB
SC725A-001-PM72008AMAT  0100-00010PFEA111-65
SC725A-001-01AMAT 0100-00052PFCL 201C-10.0KN

The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218 

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