AMAT Applied Materials  0100-09293矩阵板组件

1.产 品 资 料 介 绍：

AMAT Applied Materials  0100-09293矩阵板组件 英文资料：

1、 Product positioning and core values

The AMAT 0100-09293 matrix board component (official logo: CHAMBER STORPLEX MATRIX (CH.C)) is a factory specific communication integration component for Applied Materials semiconductor equipment cavity systems. As the core hub of the Seriplex network, it undertakes the signal transfer and distribution functions between various sensors, actuators, and main control systems inside the device cavity. In precision process equipment such as photolithography and etching, it is the "nerve center" that ensures real-time feedback of cavity parameters and precise coordination of actions, directly affecting the process stability and equipment operation reliability of wafer processing.

2、 Core technical characteristics and process specifications

Technical dimension

Specific parameters and implementation details

Component Attributes

The dedicated serial communication matrix module for the cavity is designed to meet the modular integration requirements of the Seriplex bus protocol for AMAT devices

Installation and positioning

The electrical control cabinet on the side of the equipment cavity is directly connected to the main control unit of the cavity through a dedicated interface, and the installation distance must meet the requirement of ≥ 50mm heat dissipation

Core functions

Serial signal forwarding, multi device communication adaptation, fault signal isolation, supporting ≥ 8 parallel data transmission channels

Material system

The substrate is made of FR-4 glass epoxy resin (dielectric constant 4.2-4.7), and the contact area is made of gold-plated copper foil (thickness ≥ 30 μ m)

Process standards

Using immersion gold process to treat solder pads, the line width tolerance is controlled within ± 0.05mm, the insulation resistance is ≥ 10 ¹² Ω, and the withstand voltage is ≥ 500V AC

Communication performance

Support 1Mbps transmission rate under Seriplex protocol, signal delay ≤ 10 μ s, error rate<10 ⁻⁹

3、 Scene adaptation and performance advantages

1. Adaptation to Semiconductor Core Scenarios

Scenario of cavity process control: In chemical vapor deposition (CVD) and physical vapor deposition (PVD) equipment cavities, responsible for connecting pressure sensors, temperature controllers, gas flow valves and other components to achieve real-time acquisition of process parameters and command issuance, ensuring the uniformity of thin film deposition thickness.

Clean room operating environment: The substrate is made of halogen-free flame-retardant material, and the surface has undergone anti-static treatment (surface resistance 10 ⁶ -10 ⁹ Ω). It can withstand high-frequency alcohol wiping in clean rooms and meets the ISO Class 5 clean room particle release standard (>0.5 μ m particles<100 per cubic foot).

Equipment maintenance and debugging scenario: Reserve dedicated testing interfaces, support online signal diagnosis and path detection, quickly locate communication fault points, and cooperate with AMAT equipment management system to achieve fault warning and remote troubleshooting.

 AMAT Applied Materials  0100-09293矩阵板组件 产品展示      

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218