AMAT Applied Materials 0050-38614歧管

1.产 品 资 料 介 绍：

主要规格

功能与特点

• 多气路独立控制：5 个通道可分别接入不同工艺气体（如 SiH₄、N₂、Ar、O₂、CF₄ 等），避免交叉污染。
• 高精度流量分配：内部流道设计优化，确保气体流量均匀稳定，提升薄膜沉积或蚀刻均匀性。
• 高可靠性：焊接结构减少泄漏风险，适用于长期连续运行的高真空或腐蚀性环境。
• 易于维护：模块化设计，便于在线更换，降低停机时间。

应用场景

• 半导体晶圆制造：CVD、PVD、ALD、干法蚀刻等设备的气体供应系统。
• 平板显示制造：OLED、LCD 制程中的薄膜沉积和表面处理。
• 太阳能电池生产：PECVD、RIE 等工艺的气体分配。

AMAT Applied Materials  0050-38614歧管 英文资料：

AMAT Applied Materials 0050-38614 is a five channel gas distribution manifold used in semiconductor manufacturing equipment, primarily for gas delivery systems in chemical vapor deposition (CVD), physical vapor deposition (PVD), and etching processes. This manifold adopts a welded structure to ensure high airtightness and corrosion resistance, suitable for process environments containing corrosive gases.

Main specifications

Project parameters/description

Part number 0050-38614

Name: WELLMENT, MANIFOLD, 5 STAT (Five Channel Welded Manifold)

Number of channels: 5 independent gas channels

Interface type compatible with AMAT standard gas pipeline fittings (such as Swagelok or VCO)

The main material is stainless steel (SS316L or equivalent), with polished or passivated inner surfaces

Typical working pressure: 0-100 psi (depending on equipment specifications)

Working temperature -20 ℃ -150 ℃ (depending on process requirements)

Sealing method: welding+metal sealing gasket

Cleaning grade: Semiconductor grade cleanliness (ISO 4 or higher)

function and characteristic

Multi channel independent control: 5 channels can be connected to different process gases (such as SiH ₄, N ₂, Ar, O ₂, CF ₄, etc.) to avoid cross contamination.

High precision flow distribution: internal channel design optimization ensures uniform and stable gas flow, improving the uniformity of film deposition or etching.

High reliability: The welded structure reduces the risk of leakage and is suitable for long-term continuous operation in high vacuum or corrosive environments.

Easy to maintain: Modular design for easy online replacement and reduced downtime.

Application scenarios

Semiconductor wafer manufacturing: gas supply system for CVD, PVD, ALD, dry etching and other equipment.

Flat panel display manufacturing: thin film deposition and surface treatment in OLED and LCD processes.

Solar cell production: gas distribution for PECVD, RIE and other processes.

AMAT Applied Materials  0050-38614歧管 产品展示      

 产品视频

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The content is from Ruichang Mingsheng Automation Equipment Co., LTD

Contact: +86 15270269218